XUM200 Upright Metallurgical Microscope
The XUM200 is an upright metallurgical microscope with an infinity optical system, designed for inspecting polished metal surfaces, semiconductor wafers, and thin film layers.

Product Overview
The XUM200 is an upright metallurgical microscope with an infinity optical system, designed for inspecting polished metal surfaces, semiconductor wafers, and thin film layers. It features a trinocular inclined 30 ̊ head, a coaxial coarse and fine focus system with 0.7μm minimum division, and a quintuple nosepiece with ball bearing inner locating. The standard configuration includes PL L5X to PL L100X infinity plan achromatic objectives, with working distances from 0.4mm to 26.1mm. Epi-illumination uses a 6V30W or 12V50W halogen lamp with brightness control, and the stage supports mechanical movement over 204mmX204mm. A 0.5X CCD adapter is included for digital imaging.
- Optical systemInfinity
- HeadTrinocular inclined 30 ̊
- EyepieceWF10X (field number: Φ22mm)
- ObjectivePL L5X /0.12
- Working distance26.1 mm
- ObjectivePL L10X /0.25
Key Benefits
- Infinity optical system ensures consistent image quality across all magnifications
- Trinocular head with 30 ̊ inclination allows simultaneous viewing and camera capture
- Coaxial coarse and fine focus with 0.7μm fine focus division enables precise depth control
- Working distances from 0.4mm to 26.1mm support inspection of both thin and thick samples
- Mechanical stage with 204mmX204mm travel allows full coverage of large specimens
- Epi-illumination with brightness control improves contrast on reflective surfaces
- Integrated diaphragm and polarizing components reduce glare and enhance detail
- 0.5X CCD adapter enables digital imaging without loss of field of view
Application Scenarios
- Inspection of polished metal cross-sections in heat-treatment quality control
- Defect analysis of semiconductor wafers and thin film layers
- Failure analysis of castings, welds and machined parts in metallurgy labs
- Quality control of printed circuit boards and surface-mounted components
- Documentation of microstructure features with a digital camera attached to the trinocular head
- Teaching metallography techniques in university or vocational training labs
- Comparative analysis of surface treatments like plating, anodizing and coating
Who It Is For
- Metallurgy and materials science labs in manufacturing plants
- Quality assurance teams in automotive, aerospace and tooling industries
- Semiconductor and electronics manufacturing inspection lines
- University and technical school teaching labs for materials science
- Research labs conducting microstructure analysis and failure investigation
Problems It Solves
- Fixed focus systems require sample repositioning for depth changes; the XUM200's fine focus allows precise depth control
- Standard microscopes lack epi-illumination for reflective samples; the XUM200 uses halogen epi-illumination for metal surfaces
- Small working distances limit sample handling; the XUM200 offers working distances from 0.4mm to 26.1mm
- Manual stage movement lacks precision; the mechanical stage provides repeatable, large-area scanning
- Separate camera and microscope setups often mismatch tube diameter; the 0.5X CCD adapter fits standard 23mm tube
- No integrated polarizing components in basic models; the XUM200 includes push-pull analyzer and polarizer
Technical Features
- Infinity optical system with plan achromatic objectives for flat field imaging
- Trinocular inclined 30 ̊ head with 100% light flux transmission to camera
- Coaxial coarse and fine focus with tension adjustment and limit stopper
- Quintuple nosepiece with backward ball bearing inner locating for smooth rotation
- Mechanical stage with 280mmX270mm size and 204mmX204mm travel range
- Integrated field diaphragm, aperture diaphragm, and color filter switching device
- Push-pull type analyzer and polarizer for polarization microscopy
- Epi-illumination with 6V30W or 12V50W halogen lamp and brightness control
- 0.5X CCD adapter included for digital imaging with USB or HDMI output
Specifications
| Optical system | Infinity |
|---|---|
| Head | Trinocular inclined 30 ̊ |
| Eyepiece | WF10X (field number: Φ22mm) |
| Objective | PL L5X /0.12 |
| Working distance | 26.1 mm |
| Objective | PL L10X /0.25 |
| Working distance | 20.2 mm |
| Objective | PL L20X /0.40 |
| Working distance | 8.80 mm |
| Objective | PL L40X /0.60 |
| Working distance | 3.98 mm |
| Objective | PL L50X /0.70 |
| Working distance | 3.68 mm |
| Objective | PL L60X /0.7 |
| Working distance | 3.18 mm |
| Objective | PL L80X /0.80 |
| Working distance | 1.25 mm |
| Objective | PL L100X /0.85 |
| Working distance | 0.4 mm |
| Epi-illumination | 6V30W halogen with brightness control |
| Epi-illumination | 12V50W halogen with brightness control |
| Diaphragm | Integrated field diaphragm, aperture diaphragm, color filter switching device |
| Analyzer | Push-pull type |
| Polarizer | Push-pull type |
| Focus system | Coaxial coarse/fine focus with tension adjustable and limit stopper |
| Fine focus division | 0.7μm |
| Nosepiece | Quintuple (Backward ball bearing inner locating) |
| Stage | Mechanical stage |
| Stage size | 280mmX270mm |
| Stage travel | 204mmX204mm |
| CCD adapter | 0.5X |
| CCD adapter | 1.0X |
| CCD adapter | 0.5X with dividing 0.1mm/Div |
Specifications are taken from the AMADA product data for this item. Confirm critical dimensions with us in writing before ordering.
Customization Options
- Choose between standard and optional objectives (PL L5X to PL L100X)
- Select between 6V30W or 12V50W epi-illumination lamp
- Add optional CCD adapters: 1.0X or 0.5X with 0.1mm/Div division
- Replace trinocular head with binocular head if camera is not required
- Add optional polarizer or analyzer if polarization microscopy is needed
Comparison With Other Options
| XUM200 without trinocular head | The trinocular head allows simultaneous viewing and digital capture; the binocular version only supports eye viewing. |
|---|---|
| XUM200 with standard 0.5X CCD adapter | The 1.0X adapter increases magnification for high-resolution imaging; the 0.5X adapter preserves field of view for large samples. |
| XUM200 with 0.5X adapter and 0.5X with division | The 0.5X with 0.1mm/Div adapter enables precise measurement of surface features; the standard 0.5X does not include a scale. |
Use Guide
- Adjust the interpupillary distance before focusing to ensure a single merged image
- Start focusing at the highest magnification objective, then move to lower magnifications
- Use the 0.5X CCD adapter for full field coverage when capturing images
- Set the halogen lamp brightness to match the sample reflectivity and avoid overexposure
- Use the push-pull analyzer and polarizer to switch between polarized and non-polarized light
- Keep the mechanical stage locked when not moving to prevent accidental shifts
- Calibrate the 0.5X with 0.1mm/Div adapter before taking measurements
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Frequently Asked Questions
What is the working distance for the PL L100X objective?
0.4mm.
Can I use this microscope for semiconductor wafer inspection?
Yes. The infinity optical system and epi-illumination are suitable for reflective surfaces like wafers and thin films.
Does the trinocular head allow full light transmission to the camera?
Yes. The trinocular head is designed for 100% light flux transmission to the camera port.
What CCD adapters are available?
Standard 0.5X and 1.0X; optional 0.5X with 0.1mm/Div division for measurement.
Can I use a different lamp than 6V30W or 12V50W?
The epi-illumination system is designed for these two halogen lamps; other lamps are not supported.
Is the polarizer and analyzer included?
Yes. The XUM200 includes push-pull type analyzer and polarizer as standard.
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