1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery
The ZYLAB 1200°C Dual-Zone PECVD System is designed for advanced thin-film deposition processes requiring precise precursor evaporation, stable plasma conditions, and reliable exhaust management. Equipped with a solid–liquid evaporation module, 4-channel mass-flow-controlled gas delivery, and an anti-condensation...
Product Overview
The ZYLAB 1200°C Dual-Zone PECVD System is designed for advanced thin-film deposition processes requiring precise precursor evaporation, stable plasma conditions, and reliable exhaust management. Equipped with a solid–liquid evaporation module, 4-channel mass-flow-controlled gas delivery, and an anti-condensation exhaust treatment design, this system offers a highly efficient, safe, and environmentally friendly PECVD solution.
In this configuration, a liquid vapor generator is installed at the front end to ensure accurate delivery of liquid precursors, while a vacuum pump exhaust treatment tank is integrated at the backend to minimize harmful emissions. Together, they create a stable and clean deposition environment, preventing condensate buildup and ensuring long-term operational reliability.
This PECVD system is ideal for research institutes, laboratories, semiconductor processing, epitaxy, dielectric coatings, surface modification, and high-precision material deposition applications.
Key Features of 1200°C Dual-Zone PECVD System
1. Precision Temperature Control System
Advanced PID regulation: Ensures highly accurate control of evaporation and deposition temperatures for optimal precursor vaporization.
Fast response: Supports rapid heating and cooling to accommodate diverse process requirements.
2. High-Efficiency Evaporation
Optimized evaporator design: Maximizes evaporation efficiency while minimizing residue buildup, ensuring stable and consistent vapor delivery.
3. Reliable Anti-Condensation Measures
The vacuum pump exhaust treatment tank effectively removes or reduces harmful gases such as VOCs, acidic compounds, and particulates.
Prevents condensation inside pipelines and equipment, ensuring safe operation and compliance with environmental standards.
4. Intelligent Control & Monitoring
Touch-screen interface: Intuitive operation for parameter setting, process control, and system monitoring.
Data logging & analysis: Automatically records key operational data and generates exportable reports for process optimization.
5. 4-Channel Gas Delivery System
Equipped with high-precision mass flow controllers (MFCs), allowing accurate and independent gas input control for complex PECVD processes.
Optional Upgrades (Exhaust Gas Purifier)
ZYLAB Epitaxial Furnace Exhaust Gas Purifier
Features two spray chambers + one packed column
Manual negative pressure control
Adjustable water replenishment
Achieves up to 99.99% removal efficiency for water-soluble gases
Ideal for semiconductor epitaxy, PECVD, LPCVD, MOCVD, and other gas-heavy processes.
Typical Application
Semiconductor Processing
Deposition of dielectric films, passivation layers, barrier coatings, and encapsulation layers for silicon wafers, compound semiconductors, and advanced microelectronics.Surface Engineering & Functional Coatings
Fabrication of protective, optical, insulating, and barrier films used in optics, energy devices, and electronic components.Epitaxy and Material Growth
Controlled deposition of high-purity thin layers for epitaxial structures and advanced material synthesis.Nanomaterials & Advanced Thin Films
Growth of nanostructured films, nanocomposites, and functional materials requiring precise plasma-enhanced reactions.MEMS & Sensor Fabrication
Deposition of structural, insulating, and functional layers for micro-electromechanical systems and high-sensitivity sensors.Photovoltaics & Energy Technologies
Thin-film deposition for solar cells, battery electrodes, protective layers, and energy storage materials.R&D Laboratories & Universities
Experimental development of new thin-film processes, precursor studies, material property research, and atmospheric/temperature-dependent deposition experiments.
How to Choose the Right PECVD Furnace?
Specifications
Figures below are the manufacturer data for this model. Anything not listed is confirmed in writing with the quotation rather than estimated here.
| Model | PECVD1200-80-2 | |
|---|---|---|
| Rated Power | 7.5 kW + 1.5 kW | |
| Power Supply | Three-phase 380 V, 50 Hz | |
| RF Frequency | 13.56 MHz | |
| RF Power Range | 0–500 W | |
| Deposition Heating Power | 2.5 kW | |
| Evaporator Rated Power | 1.3 kW | |
| Heating Tape Power | 75 W | |
| Maximum Temperature (Tmax) | 1200°C | |
| Deposition Temperature | 1150°C | |
| Evaporator Temperature | 400°C | |
| Heating Tape Temperature | 150°C | |
| Temperature Accuracy | ±1°C | |
| Sensor Type | K-type Thermocouple | |
| Heating Rate | 1°C/h – 20°C/min | |
| Chamber Size | (Zone 1)Φ150 × 200 mm | |
| (Zone 2)Φ150 × 200 mm | ||
| Quartz Tube Size | Φ80 × 1400 mm | |
| Heating Element | Mo-doped Fe-Cr-Al Alloy | |
| Gas Delivery (4 Channels) | Mass Flow Controllers: S500 50 SCCM × 2 channels: Φ6.35 compression fittings, N₂-calibrated S500 30 SCCM × 1 channel: Φ6.35 compression fittings, N₂-calibrated S500 1000 SCCM × 1 channel: Φ6.35 compression fittings, N₂-calibrated | |
| Control System | Programmable sintering/processing curves with dynamic graphical display Scheduled processing for unattended operation Real-time power/voltage display, full data recording and export Remote monitoring and control capability Temperature calibration: Non-linear correction based on master and sample temperature deviations | |
| Liquid Vapor Generator + Peristaltic Pump | Ensures precise delivery of liquid precursors Efficient conversion from liquid to vapor phase Guarantees uniform gas transport, enhancing film quality and process repeatability | |
| Vacuum Pump Exhaust Treatment Tank | Removes VOCs, acidic gases, and particulates Prevents condensation and pipeline contamination Ensures emissions meet environmental safety standards Protects equipment and operator safety | |
| Furnace size | 2230 × 800 × 1300 mm | |
| Net weight | 260 kg | |
| Service Support | 1-year limited warranty, with lifetime support (Warranty excludes consumable parts such as processing tubes and O-rings; please order replacement parts from the related products section below). |
1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery In Detail
Processes This Unit Supports
These are the applications ZYLAB lists this model under. Each link opens the full equipment set for that process, which is useful when a project needs more than one machine.
Who Orders It
Fields this model already works in, plus what ZYLAB puts behind it: a 2-year warranty on most products, glass excluded, spare parts in stock and free application support by WhatsApp or email.
Related Projects
Related Equipment
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Ordering 1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery
What is 1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery typically used for?
The ZYLAB 1200°C Dual-Zone PECVD System is designed for advanced thin-film deposition processes requiring precise precursor evaporation, stable plasma conditions, and reliable exhaust management. Equipped with a solid–liquid evaporation module, 4-channel mass-
How quickly can 1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery be shipped?
Most standard ZYLAB models are held in stock. After testing and packing we normally ship 1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery within 3 to 7 days. Customised builds are scheduled after the drawing is confirmed, and we give you the date in writing before the order is placed.
Is there a minimum order quantity for 1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery?
No. ZYLAB has no minimum order requirement, so a single unit of 1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery is a normal order. Occasionally a component supplier imposes a minimum quantity of their own, and we tell you as soon as we are notified.
Can we get technical help before ordering 1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery?
Yes, and it is free. Our technical staff help with model selection, troubleshooting, manuals and application questions whether or not you have ordered from us before. Write to [email protected] or message us on WhatsApp.
What if 1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery is damaged in transit?
Contact your ZYLAB sales engineer immediately with photographs. We arrange a substitute delivery promptly and handle the claim with the carrier.
Quote For 1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery
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