High-Performance Three-Zone PECVD System for Precision Thin Film Deposition
The Three-Zone PECVD System, or Plasma Enhanced Chemical Vapor Deposition (PECVD) system, is an advanced thin-film deposition technology widely used in industries such as semiconductors, microelectronics, optoelectronics, and solar energy. The system transforms gases inside a quartz vacuum chamber into ionized states...
Introduction
The Three-Zone PECVD System, or Plasma Enhanced Chemical Vapor Deposition (PECVD) system, is an advanced thin-film deposition technology widely used in industries such as semiconductors, microelectronics, optoelectronics, and solar energy. The system transforms gases inside a quartz vacuum chamber into ionized states using RF (radio frequency) power. The high-energy electrons in the plasma activate the reactive gases, enabling chemical reactions to occur at lower temperatures, allowing the desired thin films to be deposited onto substrates.
Key Features
- Precise Temperature Control:
The three-zone design allows for more precise temperature control, meeting the different material and process requirements for temperature. With three PID temperature controllers, the temperatures in different zones can be independently regulated, ensuring that the entire deposition process occurs within the optimal temperature range. - Fast Deposition Rate:
Compared to traditional Chemical Vapor Deposition (CVD) technology, the PECVD system offers a higher deposition rate. This is mainly due to the effect of plasma, which enables chemical reactions of the precursor gases at lower temperatures, thus accelerating the deposition process. - Excellent Film Uniformity:
By controlling the frequency of the RF power, the stress level of the deposited film can be precisely adjusted, ensuring uniformity and consistency of the thin film. This precise control is crucial for producing high-quality, high-performance thin films. - High Operational Stability:
The Three-Zone PECVD system utilizes an advanced vacuum system and multi-channel proton mixing gas system, ensuring the stability and reliability of the system. During long-term operation, the system maintains consistent deposition rates and film quality, meeting the demands of large-scale production.
Wide Applications
The system can be widely used for growing nanowires, graphene, and other thin film materials. For example, in the solar cell industry, PECVD technology is used to fabricate high-quality silicon-based thin-film solar cells. In the microelectronics field, PECVD is used to produce various thin films such as SiO2, SiNx, and more.
Specifications
Figures below are the manufacturer data for this model. Anything not listed is confirmed in writing with the quotation rather than estimated here.
| Model | PECVD-1200-3-4 |
|---|---|
| CVD System | |
| Power Supply | 380V 50HZ, 9KW |
| Tmax | 1200°C |
| Rated Temperature | 1150°C |
| Touch Screen Size | 7″ |
| Temperature Zone Size | 200+200+200mm (Three-Zone, Three-Control) |
| Sensor Type | K-type Thermocouple |
| Furnace Tube Material & Dimensions | High Purity Quartz Tube, Ø801400mm |
| Recommended Heating Rate | ≤10°C/min |
| Mechanical Pump Pumping Rate | 6 m³/h, KF25 |
| Furnace Chamber Ultimate Vacuum | 3~5Pa, with Digital Vacuum Gauge |
| Gas Inlet System | Four-channel Mass Flow Controllers (100sccm, 200sccm, 500sccm, 500sccm) |
| Furnace Body Dimensions | W 1488 H 1275* D 760mm |
| Plasma Generator | |
| RF Frequency | 13.56MHz |
| RF Power Output Range | 0-500W (adjustable) |
| Dimensions | W 275mm × H 380mm × D 430mm |
| RF Power | 500W |
| Control System | 1. Sintering Process Curve Setting: Dynamic display of the process curve, with the ability to store multiple sintering process curves, each of which can be customized. 2. Scheduled Sintering: Enables sintering to run automatically without operator intervention, based on pre-set process curves. 3. Real-time Data Display and Logging: Displays sintering power, voltage, and other relevant information in real-time, with the ability to record and export data for paperless records. 4. Remote Control: Allows for remote operation and real-time monitoring of the equipment status. 5. Temperature Calibration: Non-linear correction of the temperature difference between the main control temperature and sample temperature throughout the sintering process. |
| Temperature Accuracy | ±1°C |
| Pressure Measurement & Monitoring | Uses a mechanical pressure gauge with a gas-tight structure to effectively protect internal components from environmental influences and debris. The gauge also has strong corrosion and high-temperature resistance. |
| Equipment Details | |
| Net Weight | 280kg |
| Service Support | 1-year limited warranty, with lifetime support (Warranty excludes consumable parts such as processing tubes and O-rings; please order replacement parts from the related products section below). |
High-Performance Three-Zone PECVD System for Precision Thin Film Deposition In Detail
Processes This Unit Supports
These are the applications ZYLAB lists this model under. Each link opens the full equipment set for that process, which is useful when a project needs more than one machine.
Who Orders It
Fields this model already works in, plus what ZYLAB puts behind it: a 2-year warranty on most products, glass excluded, spare parts in stock and free application support by WhatsApp or email.
Related Projects
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Ordering High-Performance Three-Zone PECVD System for Precision Thin Film Deposition
What is High-Performance Three-Zone PECVD System for Precision Thin Film Deposition typically used for?
The Three-Zone PECVD System, or Plasma Enhanced Chemical Vapor Deposition (PECVD) system, is an advanced thin-film deposition technology widely used in industries such as semiconductors, microelectronics, optoelectronics, and solar energy. The system transform
How quickly can High-Performance Three-Zone PECVD System for Precision Thin Film Deposition be shipped?
Most standard ZYLAB models are held in stock. After testing and packing we normally ship High-Performance Three-Zone PECVD System for Precision Thin Film Deposition within 3 to 7 days. Customised builds are scheduled after the drawing is confirmed, and we give you the date in writing before the order is placed.
Is there a minimum order quantity for High-Performance Three-Zone PECVD System for Precision Thin Film Deposition?
No. ZYLAB has no minimum order requirement, so a single unit of High-Performance Three-Zone PECVD System for Precision Thin Film Deposition is a normal order. Occasionally a component supplier imposes a minimum quantity of their own, and we tell you as soon as we are notified.
Can we get technical help before ordering High-Performance Three-Zone PECVD System for Precision Thin Film Deposition?
Yes, and it is free. Our technical staff help with model selection, troubleshooting, manuals and application questions whether or not you have ordered from us before. Write to [email protected] or message us on WhatsApp.
What if High-Performance Three-Zone PECVD System for Precision Thin Film Deposition is damaged in transit?
Contact your ZYLAB sales engineer immediately with photographs. We arrange a substitute delivery promptly and handle the claim with the carrier.
Quote For High-Performance Three-Zone PECVD System for Precision Thin Film Deposition
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