
Rapid Thermal Processing Furnace for Semiconductor
This furnace for semiconductor is a desktop manual rapid thermal annealing system operated in a protective atmosphere, designed for infrared-visible light heating of single wafer or samples. With a short processing time, high temperature control accuracy, and compatibility with 2-6 inch wafers, it stands out compared...
Introduction
This furnace for semiconductor is a desktop manual rapid thermal annealing system operated in a protective atmosphere, designed for infrared-visible light heating of single wafer or samples. With a short processing time, high temperature control accuracy, and compatibility with 2-6 inch wafers, it stands out compared to traditional diffusion furnace annealing systems and other RTP systems. The unique chamber design, advanced temperature control technology, and exclusive RL900 software control system ensure excellent thermal uniformity.
Features and Benefits
1. Infrared halogen lamp heating with air cooling
2. Lamp power PID temperature control for precise temperature ramping, ensuring good reproducibility and temperature uniformity
3. Parallel gas inlet design, with the gas inlet located on the wafer surface to prevent cold spots during annealing, ensuring excellent temperature uniformity
4. Atmospheric and vacuum processing options, with gas purification treatment before inlet
5. Standard configuration includes two sets of process gases, expandable up to six sets
6. Maximum wafer size for single crystal sample testing is 6 inches (150mm)
7. Features triple safety measures, including furnace door safety temperature opening protection, temperature controller authorization protection, and emergency stop safety protection, ensuring comprehensive instrument safety.
Specifications
Figures below are the manufacturer data for this model. Anything not listed is confirmed in writing with the quotation rather than estimated here.
| Item | Specification |
|---|---|
| Maximum Product Size | 6-inch wafer or maximum 150x150mm product |
| Temperature Range | Room temperature to 1250°C |
| Maximum Heating Rate | Up to 100°C/s (excluding the carrier ramping rate), programmable |
| Temperature Uniformity | ±5°C≤ 500°C, ±1% >500°C |
| Temperature Control Accuracy | ±1°C |
| Temperature Control | Rapid PID temperature control |
| Substrate Cooling | Nitrogen blow |
| Process Gas | MFC control, conventional three-gas (N2/O2/Ar) |
| Control Method | Industrial computer + PC control |
Rapid Thermal Processing Furnace for Semiconductor In Detail


Processes This Unit Supports
These are the applications ZYLAB lists this model under. Each link opens the full equipment set for that process, which is useful when a project needs more than one machine.
Who Orders It
Fields this model already works in, plus what ZYLAB puts behind it: a 2-year warranty on most products, glass excluded, spare parts in stock and free application support by WhatsApp or email.
Related Projects
Related Guides
Related Equipment
Models from the same family and the same processes, in case a different chamber size or temperature range fits better.

Vacuum Atmosphere Muffle Furnace for Titanium Diffusion Welding with Argon Purging and Mild Vacuum Control

Vacuum Muffle Furnace with Quartz Chamber 1200°C

1200°C Dual-Zone PECVD System with Solid–Liquid Evaporation and Anti-Condensation Design, Featuring 4-Channel Gas Delivery

Epitaxial Furnace Exhaust Gas Purifier

High Purity Alumina Planetary Milling Jar for Laboratory Grinding

Laboratory Stainless Steel Vacuum Planetary Milling Jar for Nanopowder

Stainless Steel Planetary Milling Jars – High-Performance Wet & Dry Milling

1300°C Lab Furnace with Safe Door Opening at High Temperature
Ordering Rapid Thermal Processing Furnace for Semiconductor
What is Rapid Thermal Processing Furnace for Semiconductor typically used for?
This furnace for semiconductor is a desktop manual rapid thermal annealing system operated in a protective atmosphere, designed for infrared-visible light heating of single wafer or samples. With a short processing time, high temperature control accuracy, and
What warranty comes with Rapid Thermal Processing Furnace for Semiconductor?
Most ZYLAB products carry a 2-year warranty, glass components excluded; the exact term for this model is the one printed in its specification table and repeated on the quotation. Within the warranty period any part that fails through no misuse of your own is replaced free of charge.
Can we get technical help before ordering Rapid Thermal Processing Furnace for Semiconductor?
Yes, and it is free. Our technical staff help with model selection, troubleshooting, manuals and application questions whether or not you have ordered from us before. Write to [email protected] or message us on WhatsApp.
Which shipping methods do you use?
Sea freight for consignments over about 60 kg (11-30 days to North America, 25-33 days to Europe, 7-20 days to Southeast Asia), air freight to airport in roughly 7-10 days, and DHL, FedEx or UPS door to door in about 5-7 days for small urgent items.
How can we pay for Rapid Thermal Processing Furnace for Semiconductor?
Bank (wire) transfer, letter of credit for larger orders, major credit and debit cards, and PayPal. Bank details are printed on the invoice; send us the transfer confirmation and we start processing straight away.
Quote For Rapid Thermal Processing Furnace for Semiconductor
Tell us the sample, the temperature and the atmosphere. You get the configuration, the price and the despatch date in one reply.
