Epitaxial Furnace Exhaust Gas Purifier

Overview

The ZYLAB Epitaxial Furnace Exhaust Gas Purifier is a high-efficiency wet scrubbing system specially designed for the treatment of exhaust gases generated during semiconductor epitaxial processes. The system adopts a dual spray chamber and a single packed column design to ensure the safe and efficient removal of silane (SiH₄), phosphine (PH₃), boron trifluoride (BF₃), and other hazardous gases. With an advanced multi-stage washing structure and manual negative-pressure control, this unit achieves up to 99.99% removal efficiency for water-soluble gases while ensuring stable, low-cost operation.

1. Advanced Structural Design

• Integrated two spray chambers and one packed column chamber for superior purification performance.

• Manual negative pressure control allows flexible adjustment according to process requirements.

• Manual and automatic water replenishment system ensures optimal liquid circulation and scrubbing efficiency.

• High removal rate of up to 99.99% for water-soluble gases.

2. Wide Range of Gas Handling

Effectively treats the exhaust gases generated from epitaxial processes, including:
SiH₄, PH₃, GeH₄, SiO₂, B₂H₆, BF₃, N₂O, C₄F₈, CF₄, GeCl₄, SiCl₄, SiHCl₃, Cl₂, BCl₃, CCl₄, CCl₂, F₂, H₂S, NH₃, HCl, H₂SO₄, SO₂, and dust particles.

3. System Components and Control

Exhaust Fan

• Equipped with one exhaust fan for stable operation.

• The fan does not rely on a frequency converter or negative pressure transmitter for stability.

Circulation Pump

• Includes a magnetically driven circulation pump with outlet filtration for reliability and chemical resistance.

Water Supply and Drainage

• Manual + automatic water replenishment design.

• Manual drainage control for convenient maintenance.

Automatic Dosing Control

• Integrated pH control and automatic dosing system, including:

  • pH probe, metering pump, signal cable, and dosing tank (without agitator).

  • pH range adjustable between 4–6, automatically controlled via PLC feedback.

  • Chemical dosing automatically adjusts according to real-time process conditions.

  1. Compressed Air Safety Control

  Continuous compressed air (2500 L/h) accelerates self-ignition of silane gas, preventing accumulation. Recommended air supply pressure ≥ 7 Bar.

  2. Nitrogen Safety Control

  In emergency or alarm conditions, nitrogen purging is activated to dilute silane gas and reduce explosion risk.

  3. Anti-Static Safety Design

  The exhaust scrubber body is made from anti-static PVC to prevent electrostatic discharge.

  4. Wet-Process Safety Control

  Adopts a wet scrubbing process to reduce heat from silane reactions and achieve hydrolysis, providing effective flame suppression.

  High Stability and Reliability

  • Continuous compressed-air feeding ensures complete combustion of silane (SiH₄) and maintains system safety within hydrogen limits.

  • Multiple high-speed atomization pre-wash stages guarantee excellent dust and gas removal.

  • The discharge cone structure generates slight negative pressure, enhancing cleaning capacity.

  • Independent water and drainage circuits prevent clogging and allow for continuous operation without downtime.

  • Modular design enables one-click liquid replacement, simplifying maintenance.

  • PLC-based local control panel with a TCP/IP interface for data communication and system integration with external equipment.

  Environmental Compliance

  Emission levels comply with:

  • GB16297-1996 – Integrated Emission Standard of Air Pollutants (Class II)

  • GB30484-2013 – Pollutant Discharge Standard for Battery Industry

  Wastewater Management

  The scrubbing solution should be replaced every 10–15 days to maintain purification performance. Wastewater is typically near-neutral and can be discharged directly into the facility’s sewage network by simply opening the drain valve—safe, clean, and easy to operate.