Chemical Vapor Deposition (CVD) System
Chemical Vapor Deposition (CVD) refers to a method where chemical gases or vapors react on the surface of a substrate to synthesize coatings or nanomaterials. It is a widely used technology in the semiconductor industry for depositing thin film materials, including a broad range of insulating materials, as well as...
Introduction
Chemical Vapor Deposition (CVD) refers to a method where chemical gases or vapors react on the surface of a substrate to synthesize coatings or nanomaterials. It is a widely used technology in the semiconductor industry for depositing thin film materials, including a broad range of insulating materials, as well as most metal and metal alloy materials. In response, we have developed a comprehensive CVD coating system suitable for major university materials laboratories, research institutes, and fields such as environmental science.
Features
1.Utilizing high-purity quartz furnace tube with excellent corrosion resistance and high-temperature performance.
2.High-purity Al2O3 fiber refractory insulation material, providing superior insulation and reducing equipment power consumption.
3.The furnace body employs a double-layer air-cooling structural design.
4.Sintering process curve settings: Dynamically display and set curves, allowing the pre-storage of multiple sintering processes. Each process curve can be freely configured. 7” colored graphic touch panel, more intuitive and convenient operation.
5.Scheduled sintering allows for unmanned operation, implementing scheduled sintering process curves.
6.Real-time display of sintering power, voltage, and other information, recording sintering data, and enabling paperless documentation export.
7.Capable of remote control to observe equipment status in real-time.(Optional)
8.Temperature calibration: Non-linear correction is conducted throughout the entire sintering process based on the temperature difference between the main control temperature and sample temperature.
9.The integrated equipment includes a multi-channel gas supply system, heating system, and vacuum system.
Specifications
Figures below are the manufacturer data for this model. Anything not listed is confirmed in writing with the quotation rather than estimated here.
| Model | O1200-XTI (Tube diameter : 50/60/80/100mm Optional) | |||
|---|---|---|---|---|
| Working temperature | ≤1150℃ | |||
| Heating length | 440mm | |||
| Heating rate | ≤20℃/min | |||
| Power supply | AC 220V 4KW | |||
| Gas supply system (Optional) | Flowmeter type | Float flow meter | Mass Flow Controller (MFC) | |
| Piping Diagram | ||||
| Quantity of Inlet ports | 2、3、4 (Multiple Options Available) | |||
| Flow Range | 20-250/20-800ml/min ( Multiple range optional) | 50/100/200/500sccm ( Multiple range optional) | ||
| Operating Pressure Differential Range | 0-0.15MPa | |||
| Low Vacuum System (Optional) | Vacuum model | 1.5C | 3C | 4C |
| Pumping rate | 1L/s | 3L/s | 4L/s | |
| Inlet and Outlet Port Dimensions | 8mm Pagoda Joint | 8mm Pagoda Joint | KF16/25 | |
| Ultimate Vacuum Level | 1000Pa | 100Pa | 10Pa | |
| Operating Environment Temperature | 5-40℃ | |||
| Power supply | AC220V | |||
| High Vacuum System (Optional) | Vacuum model | 103(A) | 103(B) | 103(C) |
| Pumping rate | 110L/s | 600L/s | 700L/s | |
| Vacuum Gauge | Compound Vacuum Gauge | |||
| Ultimate Pressure | 10^-3Pa | 10^-4Pa | 10^-5Pa | |
| Working Environment Temperature | 5-40℃ | |||
| Power supply | AC 220V | AC 220V | AC 380V |
Chemical Vapor Deposition (CVD) System In Detail
Processes This Unit Supports
These are the applications ZYLAB lists this model under. Each link opens the full equipment set for that process, which is useful when a project needs more than one machine.
Who Orders It
Fields this model already works in, plus what ZYLAB puts behind it: a 2-year warranty on most products, glass excluded, spare parts in stock and free application support by WhatsApp or email.
Related Projects
Related Equipment
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Ordering Chemical Vapor Deposition (CVD) System
What is Chemical Vapor Deposition (CVD) System typically used for?
Chemical Vapor Deposition (CVD) refers to a method where chemical gases or vapors react on the surface of a substrate to synthesize coatings or nanomaterials. It is a widely used technology in the semiconductor industry for depositing thin film materials, incl
How quickly can Chemical Vapor Deposition (CVD) System be shipped?
Most standard ZYLAB models are held in stock. After testing and packing we normally ship Chemical Vapor Deposition (CVD) System within 3 to 7 days. Customised builds are scheduled after the drawing is confirmed, and we give you the date in writing before the order is placed.
Is there a minimum order quantity for Chemical Vapor Deposition (CVD) System?
No. ZYLAB has no minimum order requirement, so a single unit of Chemical Vapor Deposition (CVD) System is a normal order. Occasionally a component supplier imposes a minimum quantity of their own, and we tell you as soon as we are notified.
Can we get technical help before ordering Chemical Vapor Deposition (CVD) System?
Yes, and it is free. Our technical staff help with model selection, troubleshooting, manuals and application questions whether or not you have ordered from us before. Write to [email protected] or message us on WhatsApp.
What if Chemical Vapor Deposition (CVD) System is damaged in transit?
Contact your ZYLAB sales engineer immediately with photographs. We arrange a substitute delivery promptly and handle the claim with the carrier.
Quote For Chemical Vapor Deposition (CVD) System
Tell us the sample, the temperature and the atmosphere. You get the configuration, the price and the despatch date in one reply.