Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing
The ZYLAB Multi-Zone High Temperature Quartz Tube Annealing Furnace for semiconductor wafer annealing, thin film heat treatment, and advanced materials research. Equipped with a 200 mm diameter high-purity quartz tube and three independently controlled heating zones, this furnace ensures excellent temperature...
Introduction
The ZYLAB Multi-Zone High Temperature Quartz Tube Annealing Furnace for semiconductor wafer annealing, thin film heat treatment, and advanced materials research. Equipped with a 200 mm diameter high-purity quartz tube and three independently controlled heating zones, this furnace ensures excellent temperature uniformity and precise thermal control for demanding wafer processing applications.
With intelligent PID self-tuning fuzzy control, high vacuum capability, and a user-friendly 7-inch touchscreen control system, this quartz tube annealing furnace delivers reliable and repeatable performance for laboratories, universities, and semiconductor production environments.
This system is ideal for processes requiring precise temperature profiles, controlled atmospheres, or vacuum conditions.
1. High-Purity Quartz Tube for Clean Processing
The furnace is equipped with a high-purity quartz tube (φ200 mm), ensuring minimal contamination during high-temperature wafer annealing and semiconductor processing.
2. Three Independent Multi-Zone Temperature Control
Three individually controlled heating zones allow precise creation of uniform or gradient temperature profiles, making it ideal for:
Semiconductor wafer annealing
Thin film annealing
Diffusion processes
Materials research
3. High Precision PID Temperature Control
Advanced PID self-learning fuzzy control system provides excellent temperature stability and accuracy within ±1°C, ensuring consistent and repeatable results.
4. High Vacuum Capability
The furnace supports vacuum operation with an ultimate vacuum level of 10 Pa, suitable for vacuum annealing and controlled atmosphere processing.
5. User-Friendly 7-inch Touchscreen Interface
The integrated 7-inch touchscreen control panel provides intuitive operation, programmable temperature profiles, and real-time monitoring.
6. Reliable and Durable Heating System
High-quality Fe-Cr-Al alloy heating elements provide:
Long service life
Stable heating performance
High temperature capability up to 1150°C
Applications of High Temperature Quartz Tube Annealing Furnace
Semiconductor wafer annealing
Silicon wafer thermal processing
Thin film annealing
Diffusion and oxidation processes
Semiconductor material research
Nanomaterials heat treatment
Electronic materials processing
University and research laboratory applications
Specifications
Figures below are the manufacturer data for this model. Anything not listed is confirmed in writing with the quotation rather than estimated here.
| Model | O1200-200 |
|---|---|
| Power Supply | Three-phase 380V, 50Hz |
| Rated Power | 20 kW |
| Heating Element | High-quality Fe-Cr-Al alloy wire |
| Temperature Accuracy | ±1°C |
| Temperature Sensor Type | K-type thermocouple |
| Maximum Temperature (Tmax) | 1150°C |
| Long-term Operating Temperature | 300~1150°C |
| Heating Zone Dimensions | φ200 × (300+400+300) mm |
| Tube Material | High-purity quartz tube |
| Furnace Dimensions (L×D×H) | 2000 × 770 × 1300 mm |
| Heating Rate | 1°C/H – 20°C/Min |
| Ultimate Vacuum | 10 Pa |
| Weight | Approx. 400 kg |
| Sealing System | |
| Heating Chamber | |
| Gas Flow Control (Dual Float Flow Meters) |
Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing In Detail
Processes This Unit Supports
These are the applications ZYLAB lists this model under. Each link opens the full equipment set for that process, which is useful when a project needs more than one machine.
Who Orders It
Fields this model already works in, plus what ZYLAB puts behind it: a 2-year warranty on most products, glass excluded, spare parts in stock and free application support by WhatsApp or email.
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Ordering Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing
What is Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing typically used for?
The ZYLAB Multi-Zone High Temperature Quartz Tube Annealing Furnace for semiconductor wafer annealing, thin film heat treatment, and advanced materials research. Equipped with a 200 mm diameter high-purity quartz tube and three independently controlled heating
Can Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing be customised for our process?
Yes. Chamber or tube size, temperature profile, atmosphere, gas path, control system and data recording can all be adapted. Send us your process conditions and sample details and our engineers work out a configuration with you.
What warranty comes with Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing?
Most ZYLAB products carry a 2-year warranty, glass components excluded; the exact term for this model is the one printed in its specification table and repeated on the quotation. Within the warranty period any part that fails through no misuse of your own is replaced free of charge.
How can we pay for Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing?
Bank (wire) transfer, letter of credit for larger orders, major credit and debit cards, and PayPal. Bank details are printed on the invoice; send us the transfer confirmation and we start processing straight away.
How is Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing packed for export?
Packing is chosen for the safety of the machine against freight cost, typically a plywood or wooden crate with internal padding and vacuum-sealed accessories. Export documents such as Form A, Form E and Form F can be issued to help you save duty.
Quote For Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing
Tell us the sample, the temperature and the atmosphere. You get the configuration, the price and the despatch date in one reply.