CVD Graphene Growth Furnace

Introduction

The Graphene Growth Furnace(Rapid Thermal Processing Furnace) is referred to as RTP furnace, which not only has a very fast heating rate, but also can directly move the sample to room temperature after the sintering process is completed to achieve rapid cooling in the physical state.
The equipment adopts the gas path structure of the inner tube inlet and the outer tube outlet, so that the reaction atmosphere can fully and evenly contact the processed samples.
It is a common equipment for growing large-size two-dimensional graphene by CVD method. The temperature measuring element is in direct contact with the sample to ensure the accuracy of the sample temperature.

Characteristics：

1. Double layer steel structure.
2. Max speed of temperature rising up to 100.C/S.
3. Double layer tube structure, the sample exposes in the atmosphere much more Constantly.
4.Measure the temperature of the sample surface directly, more accuracy.
5.The chamber can move from one side to another side according to users’ preset, this will meet more lab applications.
6.Rich expansion interface, to meet the needs of various types of tests.
7. High-purity Al2O3 fiber refractory insulation material saves energy to the greatest extent.

Applications

• RTA(Rapid Thermal Annealing);
• Graphene and other vapor deposition, epitaxial growth of carbon nanotubes, etc.
• RTO; RTN (Rapid Thermal Oxidation/Rapid Thermal Nitridation);
• Silicidation;
• Diffusion;
• Implant Annealing;
• Contact Alloying;
• Crystallization and Densification.